Optical-beam profiling by bias-controlled metal-semiconductor-metal structures

dc.contributor.authorSanya Khunkhaoen_US
dc.date.accessioned2555-08-04T15:47:26Z
dc.date.available2555-08-04T15:47:26Z
dc.date.issued2549-06-22
dc.description.abstractRecently we have shown experimentally that a planar metalsemiconductor- metal(MSM) structure having a wide separation between the two metal electrodes exhibits not only the function of a basic optical sensor but also optical sensitivity field-controllable by the bias applied [I]. In this study, we present the experimental results of onedimensional (ID) optical-beam profiling properties of an MSM structure as its application. To our knowledge, no study has appeared on such an application of planar MSM structures.en_US
dc.identifier.citationAsia-Pacific Conference on Semiconducting Silicides : Science and Technologyen_US
dc.identifier.urihttps://dspace.spu.ac.th/handle/123456789/3777
dc.language.isootheren_US
dc.publisherAPAC-SILICIDE 2006en_US
dc.subjectOptical-beamen_US
dc.titleOptical-beam profiling by bias-controlled metal-semiconductor-metal structuresen_US
dc.typeArticleen_US

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